CHEMIE PUMP-STAND PC 3004 VARIO SELECT,

The combination of speed controlled VARIO^® chemistry diaphragm pumps and the new VACUU·SELECT vacuum controller makes the VARIO^® select chemistry pumps the ideal solution for chemical processes that require precise vacuum, such as rotary evaporation, vacuum drying or vacuum concentration.

• High chemical resistance and therefore ideally suited for pumping aggressive gases and vapours.
• Short process times and smooth running due to optimal setting of the pressure via the VACUU·SELECT controller.
• The VARIO^® technology controls the vacuum precisely and efficiently via motor speed.
• Power consumption, maintenance and noise are exceptionally low.
• The outlet catchpot and solvent condenser combine to prevent solvent vapor emissions into the lab, allowing for nearly full recovery of solvents.

Country-specific power cord versions available on request.