CHEMISTRY VACUUM SYSTEM MD 4C NT +AK+EK,

Compact design, ready to use, no set-up required. Constructed in chemically resistant materials. Quiet operation.

• 100% oil-free pumping of gases
• gas ballast as standard for working with condensable vapours
• good vacuum even with gas ballast
• high vapour tolerance for water and solvents
• long service life, low maintenance

Features:
2AK: Inlet and outlet separator
AK + EK: Inlet separator, exhaust vapour condenser
PC 510 select (two-stage) / 610 select (three-stage) : with AK + EK; 1 electronically controlled vacuum port
PC 511 select (two-stage) / 611 select (three-stage) : with AK + EK; 1 electronically controlled and 1 manually controlled vacuum port
PC 520 select (two-stage) / 620 select (three-stage) : with AK + EK; 2 electronically controlled vacuum ports

Characteristics and applications:
Without vacuum control:
MZ 2C NT +2AK: e.g. filtration, distillation without condensation at the outlet
MZ 2C NT +AK+EK: Well-proven unit for a wide range of applications for a single-user, e.g. gel drying, distillation, vacuum concentrator. For solvents with medium to low volatility.
MD 1C +AK+EK: Space-saving single-user configuration. For high-boiling-point solvents.
MD 4C NT + AK+EK: Larger or multi-user applications, the local vacuum network VACUU·LAN^®. For high-boiling solvents.
MV 10C NT +EK: Four-stage diaphragm pump with exhaust vapour condenser. For particularly high demands regarding low ultimate vacuum and pumping speed in chemistry laboratories, pilot plant or small production units.

With vacuum controller:
PC 510 select / 511 select: Well-proven units for a wide range of processes in chemistry laboratories, e.g. all common solvents. PC 511 select with addtional manually controlled vacuum port.
PC 610 select / 611 select: Proven solution for supporting electronically controlled evaporation or drying processes even with many high boiling point solvents. PC 611 select with additional manually controlled vacuum port.
PC 520 select / 620 select: Compact solution for simultaneous operation of two electronically controlled vacuum applications with one single pump.